| Location | Cambridge, MA |
PROGRAM SCIENTIST, MIT.nano, will help the broader MIT.nano research community better understand the complexity of atomic layer deposition (ALD), and optionally also plasma etching, and contribute to new trends, methods, and knowledge in the lab. The position will not conduct original research and is not meant to be a direct continuation of a candidate's prior research work. In collaboration with MIT.nano staff, will identify current and emerging broad process challenges, prioritize them and find solution approaches and aggregate and disseminate this knowledge across MIT.nano. This will be done by identifying knowledge bottlenecks, reviewing the literature, designing experiments to understand and improve tool performance, and by summarizing findings in white papers and application notes for the MIT.nano user community.