Metrology Engineer

Minimum Qualifications, Metrology Engineer

• Bachelor's, Master's, or PhD in Electrical Engineering, Materials Science, Physics, or related field
• 7+ years (BS) or 5+ years (MS) or 1-3 years (PhD) of experience in semiconductor metrology or lithography
• Strong understanding of EUV lithography fundamentals and challenges (e.g., stochastic effects, photon shot noise, resist chemistry)
• Experience with data analysis tools (Python, MATLAB, JMP, or similar)
• Knowledge of statistical process control (SPC) and data-driven problem solving
• Strong analytical, troubleshooting, and communication skills

Hands-on experience with semiconductor metrology tools such as:

• CD-SEM
• Optical CD (OCD) / Scatterometry
• Overlay metrology systems

This position is contingent on the satisfactory completion of a background check; this position may require annual background checks.

Preferred Qualifications, Metrology Engineer

• In-depth knowledge of EUV/High NA EUV lithography, mask technologies, and defect inspection
• Knowledge of advanced patterning techniques (e.g., multi-patterning, self-aligned processes)
• Familiarity with optical inspection systems, actinic metrology and EUV mask inspection
• Experience with stochastic defect analysis and mitigation strategies
• Exposure to machine learning applications in metrology or process control
• Strong communication skills, ability to work in a team, and ability to lead in a fast-paced R&D environment.

Don't meet every requirement? At NY Creates we are dedicated to building a welcoming team. If you are excited about working for NY Creates but your experience doesn't exactly align perfectly with the job description, we encourage you to apply anyway, you might still be a perfect fit for this or another role.

Key Responsibilities

• Develop, implement, and optimize metrology strategies for High-NA EUV lithography processes
• Characterize critical dimension (CD), overlay, line edge roughness (LER), and stochastic defects at advanced nodes
• Evaluate and deploy cutting-edge metrology tools (e.g., CD-SEM, scatterometry, actinic inspection, e-beam inspection)
• Collaborate with lithography and process teams to understand EUV resist behavior, exposure variability, and pattern fidelity
• Analyze large datasets to identify process trends, variability sources, and yield-impacting issues
• Drive continuous improvement in measurement accuracy, precision, and throughput
  Work closely with equipment vendors to qualify and optimize metrology tools for High-NA EUV applications
• Develop automated data analysis pipelines and reporting dashboards
• Contribute to technical documentation, best practices, and knowledge sharing
• Other reasonable duties assigned